Millimeter-wave measurements of the complex dielectric constant of an advanced thick film UV photoresistCollins, C.E., Miles, R.E., Pollard, R. D., Steenson, D.P., Digby, J.W., Parkhurst, G.M., Chamberlain, J.M., Cronin, N.J., Davies, S.R. and Bowen, J. W. (1998) Millimeter-wave measurements of the complex dielectric constant of an advanced thick film UV photoresist. Journal of Electronic Materials, 27 (6). L40-L42. ISSN 0361-5235 Full text not archived in this repository. It is advisable to refer to the publisher's version if you intend to cite from this work. See Guidance on citing. To link to this item DOI: 10.1007/s11664-998-0059-6 Abstract/SummaryThe first measurement of the relative permittivity (εr) and loss tangent (tan δ) of EPON™ SU-8 advanced thick film ultraviolet photoresist is reported at frequencies between 75–110 GHz (W-band). The problems associated with such a measurement are discussed, an error analysis given, and values of εr=1.725±0.08 and tanδ =0.02±0.001 are determined.
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