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Millimeter-wave measurements of the complex dielectric constant of an advanced thick film UV photoresist

Collins, C.E., Miles, R.E., Pollard, R. D., Steenson, D.P., Digby, J.W., Parkhurst, G.M., Chamberlain, J.M., Cronin, N.J., Davies, S.R. and Bowen, J. W. (1998) Millimeter-wave measurements of the complex dielectric constant of an advanced thick film UV photoresist. Journal of Electronic Materials, 27 (6). L40-L42. ISSN 0361-5235

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To link to this article DOI: 10.1007/s11664-998-0059-6

Abstract/Summary

The first measurement of the relative permittivity (εr) and loss tangent (tan δ) of EPON™ SU-8 advanced thick film ultraviolet photoresist is reported at frequencies between 75–110 GHz (W-band). The problems associated with such a measurement are discussed, an error analysis given, and values of εr=1.725±0.08 and tanδ =0.02±0.001 are determined.

Item Type:Article
Refereed:Yes
Divisions:Faculty of Science > School of Systems Engineering
ID Code:18900
Uncontrolled Keywords:Complex permittivity, dielectric constant measurement, micromachining, millimeter wave, negative photoresist
Publisher:Springer

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