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Evaluation of negative photo-patternable PDMS for the encapsulation of neural electrodes

Delivopoulos, E., Minev, I. R. and Lacour, S. P. (2011) Evaluation of negative photo-patternable PDMS for the encapsulation of neural electrodes. In: 2011 5th International IEEE/EMBS Conference on Neural Engineering. IEEE, pp. 490-494.

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To link to this item DOI: 10.1109/NER.2011.5910593

Abstract/Summary

This communication examines the suitability of a photo-patternable polydimethylsiloxane (PP-PDMS) elastomer as an insulating material for implantable microelectrodes. PP-PDMS is produced by mixing a photoinitiator (2-hydroxy-2-methylpropiophenone) with the PDMS base and curing agent. Subsequent exposure to UV radiation and development of the elastomeric “photo-resist” allows for the definition of well-defined openings within the PP-PDMS film. The dielectric constants of PP-PDMS and PDMS are similar (ε ≈ 2.6, f <;1MHz). Gold film microelectrodes patterned on glass or a PDMS substrate are encapsulated with PP-PDMS, while recording sites as small as 104 μm2 can be obtained in the PP-PDMS layer. The cytotoxicity of the PP-PDMS was preliminary tested in vitro by culturing 3T3 fibroblasts in PP-PDMS extracts. No adverse effects were observed in cultures exposed to PP-PDMS films initially leached in isopropanol solvent for 48h.

Item Type:Book or Report Section
Refereed:Yes
Divisions:Faculty of Life Sciences > School of Biological Sciences > Department of Bio-Engineering
ID Code:33984
Publisher:IEEE

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