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Ordering in thin films of block copolymers: fundamentals to potential applications

Hamley, I.W. (2009) Ordering in thin films of block copolymers: fundamentals to potential applications. Progress in Polymer Science, 34 (11). pp. 1161-1210. ISSN 0079-6700

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To link to this article DOI: 10.1016/j.progpolymsci.2009.06.003

Abstract/Summary

The ordering of block copolymers in thin films is reviewed, starting, from the fundamental principles and extending to recent promising developments as templates for nanolithography which may find important applications in the semiconductor industry. Ordering in supported thin films of symmetric and asymmetric AB diblock and ABA triblock copolymers is discussed, along with that of more complex materials such as ABC triblocks and liquid crystalline block copolymers Techniques to prepare thin films, and to characterise ordering within them, are summarized. Several methods to align Hock copolymer nanostructures, important in several applications are outlined A number of potential applications in nanolithography, production of porous materials, templating. and patterning of organic and inorganic materials are then presented. The influence of crystallization on the morphology of a block copolymer film is briefly discussed, as are structures in grafted block copolymer films. (C) 2009 Elsevier Ltd All rights reserved.

Item Type:Article
Refereed:Yes
Divisions:Faculty of Life Sciences > School of Chemistry, Food and Pharmacy > Department of Chemistry
ID Code:11306
Uncontrolled Keywords:Block copolymers, Thin films, Nanostructures, Nanotechnology , SYMMETRIC DIBLOCK COPOLYMER, ABC TRIBLOCK COPOLYMERS, ATOMIC-FORCE MICROSCOPY, X-RAY-SCATTERING, ELECTRIC-FIELD ALIGNMENT, ORGANIZED HONEYCOMB MORPHOLOGY, CHEMICALLY PATTERNED SURFACES, HEXAGONALLY PERFORATED LAYER, SELF-ASSEMBLED MONOLAYERS, INDUCED PHASE-TRANSITIONS

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