Low-temperature partial dissociation of water on Cu(110)Ammon , C., Bayer, A., Steinruck, H.P. and Held, G. (2003) Low-temperature partial dissociation of water on Cu(110). Chemical Physics Letters, 377 (1-2). pp. 163-169. ISSN 0009-2614 Full text not archived in this repository. It is advisable to refer to the publisher's version if you intend to cite from this work. See Guidance on citing. To link to this item DOI: 10.1016/S0009-2614(03)01127-8 Abstract/SummaryThe low-temperature reactivity of water (D2O) adsorbed on clean and oxygen pre-covered Cu(1 1 0) was studied using high resolution X-ray photoelectron spectroscopy (HRXPS) and low energy electron diffraction (LEED). On the clean surface partial dissociation to hydroxyl was observed already at 95 K. Upon annealing to 220 K hydrogen bonded water-hydroxyl chains are formed. Upon further annealing water desorbs leaving behind a layer of hydroxyl, most of which desorbs recombinatively eventually. With pre-adsorbed oxygen water reacts to hydroxyl lifting the added-row reconstruction even below 225 K. Upon annealing this adsorbate layer passes through essentially the same stages as without pre-adsorbed oxygen.
Altmetric Related URLs Deposit Details University Staff: Request a correction | Centaur Editors: Update this record |
Lists
Lists
